Equipment Description

• Model：Cirie-200

Function and use

1.  Thin film etching. (Types of etchable films: Insulator: SiO2, Si3N4, Al2O3,....; Semiconductor: Si, Ge, GaAs, GaN,....; Metals: Al, Ti, TiN,....; Transparent conductive film: ITO, ZnO,....)
2.  Gasses such as Cl2, Ar, N2, O2, CF4, N2O, H2 can be introduced
3.  The vacuum (base pressure) is about 5E-6 torr, and the minimum operating pressure can reach 2 mtorr during deposition
4.  Plasma generating device: radio frequency (RF) generator
5.  Upper electrode output power ≥ 1,200W (air-cooled)
6.  Lower electrode output power ≥ 600W (air-cooled)
7.  Fully automatic vacuum Load Lock

Equipment Specifications and Applicable Substrates

• non-uniformity：< 10%
• 2”, 3”, 4”, 6” substrates and fragments

Service Notice

1. The equipment can be opened for self-operation during non-holiday days after passing the assessment.
2. Self-operators must sign up for <<Industrial Safety and Instrument Training>> and <<Instrument Certification>> on the website, and hang in “a. Basic user information”, “b. Laboratory user safety commitment statement and health notify” form after passing the two courses. Next you will be able to apply for the clean room identification certificate and magnetic card, then enter the clean room to operate the equipment.
3. Those who operate on their own for 15 hours during the day are able to operate at night and on holidays.
4. The service of this system takes 0.25 hours as a unit.
5. The delegated operation is uniformly open on Wednesdays from 09:00 to 17:00. Please confirm the time period with the instrument technician first, and then go online to make an appointment for the delegation time. If the delegation time is not on Wednesday, the fee will be charged double as a rush.
6. Cancellation must be done 1 day in advance, otherwise the usage fee will be charged in full according to the reservation time.
7. If the actual hours used are less than the reserved hours, and the difference between these two periods is more than 1 hour, the rest of the time will be calculated at 50% of the unit price.
8. If you use the equipment without a reservation, you will be charged 1.5 times.
9. Those who pass the assessment but have no record of self-operation for 6 consecutive months will be disqualified for self-operation. If you need self-operation in the future, additional application, training, and assessment will be required, only the fee will be charged at half price.

Charge

1. Project:  $350/0.25 hours for self-operation; $650/0.25 hours for delegated operation

Instrument training fee: $1700/class, instrument certification fee: $700/class

2. Non-project: $650/0.25 hours for self-operation; $750/0.25 hours for delegated operation

Instrument training fee: $1700/class, instrument certification fee: $700/class

Notices of Specimens

• Do not enter powder sample
• The power limit of ICP is 1200W
• If there is a problem while operating, please notify the relevant personnel (for example, notify the factory staff if the process gas pressure is not enough, notify the technician if it’s the instrument or other problems)
• Hydrogen is temporarily closed to general users. If you want to use hydrogen, please delegate an instrument technician to operate it
• When using new process conditions, try not to use 2mTorr for "process pressure", otherwise the reflected power may be too high, which will affect the plasma stability
• Once the instrument technician finds out that the instrument is damaged or malfunctioning, those who do not fill in the record book correctly will be suspended for two weeks for the first time. And re-examination will be performed if it’s the second time. Besides, if the equipment is damaged due to improper operation by human factors, the person will be responsible for compensation for maintenance costs
• For delegated operators, please contact the technician to confirm the delegated time period before going online for an appointment

Contact Detail